Hydrodynamic focusing devices

ABSTRACT

A micro-fluidic device containing a micro-fluidic inlet channel to convey a process flow, a plurality of micro-fluidic focusing channels to each convey one of a plurality of focusing flows, a focusing manifold coupled with the inlet channel at an inlet port thereof and with the plurality of focusing channels at a plurality of focusing channel ports thereof to focus the process flow by contacting and hydrodynamically impacting at least three sides of the process flow with the focusing flows, and a micro-fluidic outlet channel coupled with the focusing manifold at an outlet channel port to convey the combined focused process flow and focusing flow from the focusing manifold.

CROSS REFERENCE TO RELATED APPLICATION

This application is a divisional application of U.S. application Ser.No. 10/609,227 field Jun. 26, 2003, now U.S. Pat. No. 7,115,230. Thedisclosure of the prior application is considered part of and isincorporated by reference in the disclosure of this application.

BACKGROUND OF THE INVENTION

1. Field of the Invention

Embodiments of the invention relate generally to micro-fluidic devices,and more particularly, to micro-fluidic hydrodynamic focusing devices.

2. Background Information

Various hydrodynamic focusing systems, their properties, and their useshave been discussed in the patent literature. Several examples areprovided in U.S. Pat. No. 5,858,187 issued Jan. 12, 1999 to Ramsey etal., U.S. Pat. No. 6,120,666 issued Sep. 19, 2000 to Jacobson et al.,and U.S. Pat. No. 6,159,739 issued Dec. 12, 2000 to Weigl et al., andU.S. Pat. No. 6,506,609 issued Jan. 14, 2003 to Wada et al. Theabove-identified patents are not admitted to be prior art with respectto the invention by their mention in the background.

BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWINGS

The invention may best be understood by referring to the followingdescription and accompanying drawings that are used to illustrateembodiments of the invention. In the drawings:

FIG. 1 shows an approach for focusing cells in a micro-scale system bysimultaneous flow from two side channels into a main channel throughwhich the cells are being flowed.

FIG. 2A shows a front perspective view of a hydrodynamic focusingdevice, according to an embodiment of the invention.

FIG. 2B shows a front perspective view of a hydrodynamic focusing devicehaving a small-volume focusing manifold, according to an embodiment ofthe invention.

FIG. 3 shows a front perspective view of a hydrodynamic focusing device,according to another embodiment of the invention.

FIG. 4 shows a front perspective view of a hydrodynamic focusing device,according to yet another embodiment of the invention.

FIG. 5 shows conceptualized simulation results at a cross section of theoutlet channel indicated by a section line 5-5 shown in FIG. 2,according to an embodiment of the invention.

FIG. 6 shows conceptualized simulation results at a cross section of theoutlet channel indicated by a section line 6-6 shown in FIG. 3,according to an embodiment of the invention.

FIG. 7 shows conceptualized simulation results at a cross section of theoutlet channel indicated by a section line 7-7 shown in FIG. 4,according to an embodiment of the invention.

FIG. 8A-C show a method for forming a hydrodynamic focusing system by a“membrane sandwich” method, according to one embodiment of theinvention.

FIG. 9 shows a sample analysis system in which an embodiment of theinvention may be implemented.

DETAILED DESCRIPTION

In the following description, numerous specific details are set forth.However, it is understood that embodiments of the invention may bepracticed without these specific details. In other instances, well-knowncircuits, structures and techniques have not been shown in detail inorder not to obscure the understanding of this description.

I. Introduction

U.S. Pat. No. 6,506,609, issued Jan. 14, 2003, to Wada et al., discussesin part focusing of micro-particles in micro-fluidic systems. FIG. 1shows the approach represented in FIG. 1A of the '609 patent forfocusing cells 100 in a micro-scale system by simultaneous flow from twoside channels into a main channel through which the cells are beingflowed. Cells 100 (or other particles) are typically flowed from themain micro-channel into the cross-junction and focused by introducinghydrodynamic flows 102 from the two orthogonal micro-channels.Non-orthogonal micro-channels may also be used. The cells 100 areoptionally constrained to the center of a detection micro-channeldownstream from the two orthogonal micro-channels by hydrodynamic flows102 introduced from both sides as cells 100 pass through detector 104.One limitation of the system shown in FIG. 1 is that there is nofocusing or narrowing of the flow containing the cells in the verticaldirection orthogonal to the cross-junction and the cells may contact theupper and lower surfaces of the detection micro-channel.

II. Exemplary Hydrodynamic Focusing Systems

FIG. 2A shows a front perspective view of a hydrodynamic focusing device200, according to one embodiment of the invention. The hydrodynamicfocusing device contains a micro-fluidic inlet channel 220 to convey aprocess flow and a plurality of micro-fluidic focusing channels 240(240LS, 240RS, 240U, and 240L) to each convey one of a plurality offocusing flows (240LSF, 240RSF, 240UF, and 240LF). The hydrodynamicfocusing device further contains a micro-fluidic focusing manifold 210(with a plurality of areas such as 210A-210C) coupled with the inletchannel 220 at an inlet channel port 250 and with the plurality offocusing channels 240 at a plurality of focusing channel ports 270(270LS, 270RS, 270U, and 270L). The hydrodynamic focusing device focusesthe process flow by contacting and hydrodynamically impacting at leastthree sides of the process flow with the focusing flows. In theillustrated embodiment four sides, for example a left side, a rightside, a top side, and an underside, are contacted and focused inward. Inan alternate embodiment any one of the four focusing channels may beomitted, such as channel 240U, and the process flow focused bycontacting three sides of the process flow with the focusing flows.Still further the hydrodynamic focusing device includes a micro-fluidicoutlet channel 230 (with walls such as 230A and 230B) coupled with thefocusing manifold 210 at an outlet channel port 260 to convey thecombined focused process flow and focusing flow from the focusingmanifold.

In the illustrated hydrodynamic focusing device, the process flowconveyed through the inlet channel may be confined and focused usingfour focusing flows conveyed respectively through a first micro-fluidicfocusing channel 240LS on a first side of the inlet channel (on a leftside when facing downstream the inlet channel), a second micro-fluidicfocusing channel 240RS on a second side of the inlet channel (a rightside), a third upper micro-fluidic focusing channel 240U over the inletchannel, and a fourth lower micro-fluidic focusing channel 240L underthe inlet channel. It should be noted that terms such as “top”,“bottom”, “upper”, “lower”, “vertical”, “horizontal”, and the like, areused herein only to facilitate the description of the structure of theillustrated micro-fluidic device “as viewed”. It will be evident thatthe devices may be used in a variety of orientations including tiltedorientations. The first and the second focusing channels are on oppositesides of the inlet channel, and in the illustrated embodiment are angledrelative to the inlet channel so that focusing fluids conveyed throughthese channels impacts with the process fluid conveyed through the inletchannel at an angle. The angle in the illustrated embodiment issub-orthogonal and approximately 45°, although this is not required, andother angles in a range between approximately 5° to 90° may alsooptionally be employed. Smaller angles may be more difficult tofabricate, depending on the channel dimensions, although they may alsooptionally be employed. Exemplary sub-orthogonal angles areapproximately 15°, 30°, 45°, 60°, and 75°. In these sub-orthogonalangles at least a portion of a focusing flows momentum is aligned withthe process flow. The angles of the first and the second focusingchannels will often be approximately equal so that the momentumcomponents of these focusing flows, which are not aligned with themomentum of the process flow, tend to negate.

The third and the fourth focusing channels approach the focusingmanifold from the same side as the inlet channel. As shown, the thirdupper micro-fluidic focusing channel 240U may be substantiallyvertically aligned over the inlet channel 220, and a fourth lowermicro-fluidic focusing channel 240L may be substantially verticallyaligned under the inlet channel 220. The substantial alignment may offerthe advantage that a large component or vector of the flow may bealigned with the inlet flow. This may also help reduce deflecting orrotating the process flow. It will be appreciated that precise alignmentis not a requirement of the invention. If the upper and lower focusingchannels have angles relative to the inlet channel that are less thanapproximately 45°, a majority component or vector of the flow may bealigned with respect to the inlet flow. Accordingly, not greater thanapproximately 45°, 30°, or especially 15° may be employed in order toachieve the benefit associated with the illustrated embodiment. In thisembodiment substantially aligned means angles not greater thanapproximately 15° relative to the inlet channel. As shown the first andthe second focusing channels are coplanar with the micro-fluidic inletchannel in a horizontal plane, whereas the third and the fourth focusingchannels are not coplanar with the horizontal plane (they are eitherabove or below the horizontal plane).

As shown, the outlet channel may be on an opposite side of the focusingmanifold as the inlet channel, and may be substantially aligned oppositeto the inlet channel. The substantial alignment of the inlet and outletchannels may be appropriate in order to avoid significantly changing thedirection of the process fluid within the focusing manifold. In thisembodiment, substantially aligned means angles not greater thanapproximately 15° relative to the inlet channel. Small angles, oftenless than 45°, may be appropriate in alternate implementations.

The micro-fluidic channels represent micro-sized fluid passages that mayhave a cross-sectional dimension e.g., channel width, channel height,channel diameter, etc. that may be not greater than approximately onemillimeter (mm, one-thousandth of a meter, also 1000 (μm). In variousembodiments the cross-sectional dimension may be not greater thanapproximately 500 micrometers (μm, one millionth of a meter), 200 μm,100 μm, 50 μm, or 10 nm. To help put these lengths in properperspective, the cross-sectional diameter of a human hair is often onthe order of 100 μm. The invention is not limited to any known minimumcross-sectional dimension for the channels. In various embodiments thecross-sectional dimension may be greater than approximately 0.001 μm (1nm), greater than approximately 0.01 μm (10 nm), or greater thanapproximately 0.1 μm (100 nm). The optimal dimension of the channel maydepend upon the characteristics of the fluids and/or particles to beconveyed therein. An exemplary micro-fluidic channel which may be usedfor one or more of an inlet, outlet, or focusing channel, may comprise arectangular channel having a channel width of approximately 100 μm and achannel height of approximately 50 μm. The rectangular shape andspecific dimensions are not required. These miniaturized channels areoften useful for handling small sized samples and allow many channels tobe constructed in a small substrate, although this is not a requirement.As will be discussed further below, these minute sized channels promotelaminar flow that is conducive to hydrodynamic focusing as discussedherein. There is no known minimum or maximum length for the channels.Commonly the channel lengths are at least several times their width andnot more than several centimeters.

The focusing manifold 210 represents a junction configured to receiveflows introduced through the channels, focus the process flow bycontacting and hydrodynamically impacting all four sides of the processflow with focusing flow, and remove the focused process flow andfocusing flow through the outlet channel. The manifold includes an inletport 250 to receive a process flow conveyed through the inlet channel,an outlet port 260 to provide a focused process flow to the outletchannel, and a plurality of focusing channel ports 270 (270LS, 270RS,270U, and 270L) each corresponding to one of the plurality of focusingchannels to receive focusing flows. Specifically, the illustratedfocusing manifold includes a first focusing channel port 270LS (notvisible) on the first side of the inlet channel (a left side) forreceiving a focusing flow conveyed through the first focusing channel, asecond focusing channel port 270RS on a second side of the inlet channel(a right side) for receiving a focusing flow conveyed through the secondfocusing channel, a third focusing channel port 270U over the inletchannel for receiving a focusing flow conveyed through the thirdfocusing channel, and a fourth focusing channel port 270L under theinlet channel for receiving a focusing flow conveyed through the fourthfocusing channel. As shown, the third port 270U may be substantiallyvertically aligned over the inlet channel and the fourth port 270L maybe substantially vertically aligned under the inlet channel.

The particular illustrated focusing manifold has a housing or enclosuredefining a void having a shape of an upright cylinder and an enlargedvoid volume. The enlarged void volume is employed to facilitatealignment in a method of forming the focusing manifold by stacking aplurality of substrates having void portions formed therein over oneanother to complete the void. The enlarged void volume may facilitatemutual alignment of the void portions. The cylindrical shape may bereadily fabricated and lacks extremities, such as corners, which maypromote stagnant zones, although this shape is not required, and otherfocusing manifolds may have spherical, cubic, or other shapes. Often avoid volume not greater than approximately 0.1 mm³ (cubic millimeters)may be appropriate to reduce diffusion and any potential gravitysettling in the focusing manifold. For example, the illustrated manifoldmay have a diameter of approximately 250 μm, a height of approximately250 μm, and a corresponding volume of approximately 0.01 mm³. Theinventors have found that such diameters may be readily aligned when a“membrane-sandwich” fabrication approach is employed to form thefocusing manifold with the use of a relatively unsophisticated alignmentsystem, such as manual alignment with a stereo microscope. Moresophisticated alignment methods are available, such as using opticalrecognition software and alignment marks, as employed in thesemiconductor manufacturing arts. Smaller dimensions may be employed, asdesired, if a more sophisticated alignment system is used, or ifvertical alignment is not required for forming the manifold. In suchcases, exemplary manifolds may have a void volume not greater thanapproximately 0.01 mm³, 0.001 mm³, or less. If a sophisticated alignmenttool is used, or if alignment is not required, an enlarged void volumemay be avoided entirely, and a manifold may have dimensionsapproximately the same as channel dimensions.

As one example, FIG. 2B shows a front perspective view of a hydrodynamicfocusing device 200B having a small volume focusing manifold 210B,according to an embodiment of the invention. The small volume focusingmanifold 210B may have a volume that is not greater than approximately0.001 mm³. As illustrated, the focusing manifold may have a shape of arectangular solid, a width about the same as that of a 100 μm widthinlet channel, a length about the same as that of a 100 μm width sidefocusing channel, and a height about the same as that of a 50 μm highinlet channel, and a corresponding volume of approximately 0.0005 mm³.Alternatively the focusing system dimensions do not need to be equal to,but may be proportional or otherwise related to channel dimensions.

Referring again to FIG. 2A, as shown the focusing manifold may contain aplurality of optional spacing volumes 280. The illustrated spacingvolumes include a first upper spacing volume 280U between the thirdupper port 270U for the upper focusing channel and the inlet port 250,and a second lower spacing volume 280L between the fourth lower port270L for the lower focusing channel and the inlet port 250. The spacingvolumes may help to facilitate fabrication when alignment is employed informing the manifold. Also, the spacing volumes may help to slow theflow of the focusing fluids in the manifold and may help to isolate theprocess flow from the momentum of the third and fourth focusing flows,and from potential fluctuations in the momentum of these flows, andthereby reduce mixing. The amount of mixing in the manifold is expectedto be quite small. The spacing volumes are optional and may be omittedfrom the manifold. As shown, the spacing volumes may comprisecylindrical portions having diameters that are substantially the same asthe diameters of other cylindrical portions of the focusing manifold andhaving heights that are substantially the same as the heights of themicro-fluidic channels. As an example, the spacing volumes may comprisecylindrical portions or sections having diameters of approximately 250μm and heights of approximately 50 μm. Alternatively the spacing volumesmay have other shapes, cross-sectional dimensions, and heights. Oftenthe height may be less than approximately 100 μm or less thanapproximately 75 μm. As yet another option the spacing volumes may beomitted and the upper focusing channel and lower focusing channel mayrespectively be formed in the superjacent and subjacent levels relativeto the level containing the inlet and outlet channels.

An embodiment of the invention relates to a method for focusing aprocess flow in a hydrodynamic focusing device as described herein. Themethod may comprise introducing the process flow to a focusing manifoldthrough a micro-fluidic inlet channel and concurrently introducing aplurality of focusing flows to the focusing manifold through a pluralityof micro-fluidic focusing channels. Then the process flow may be focusedby impacting it on all four sides thereof with the plurality of focusingflows in the focusing manifold. Next the focused process flow may beremoved from the focusing manifold through a micro-fluidic outletchannel.

With reference to FIG. 2A, introducing the plurality of focusing flowsmay include introducing a first focusing flow to the focusing manifoldthrough the first focusing channel and the first port, introducing asecond focusing flow to the focusing manifold through the secondfocusing channel and the second port, introducing a third focusing flowto the focusing manifold through the third focusing channel and thethird port, and introducing a fourth focusing flow to the focusingmanifold through the fourth focusing channel and the fourth port. Thefluids may be introduced into the inlets using a variety of fluidmovement devices or pumps that are known in the arts. Suitable pumpsinclude among others syringe pumps, electroosmosis pumps, thermal pumps,and surface tension pumps. The fluids may be introduced as steadystreams or flows, or as discrete pulses. The flow rates and or thepressures in the different channels may be the same or different.

In performing the hydrodynamic focusing as described herein anon-turbulent, unmixed, or laminar flow may be appropriate, inasmuch asany turbulent flow may lead to undesired mixing. The Reynolds number isa well-known ratio of inertial forces to viscous forces often used tospecify whether the flow is laminar or turbulent. In laminar flow, whenthe Reynolds number is low, such as not greater than 1, the viscousforces are larger than the inertial forces, and the fluid moves withsmooth streamlines that are substantially parallel to the channel walls.True laminar flow lacks eddies where the streamlines break into complexor chaotic spirals or other random or turbulent fluctuations that causemixing in the direction normal to flow. The use of the term laminar flowherein encompasses potentially limited amounts of turbulence orlocalized turbulence consisting of a few eddies at the point where thefocusing fluids impact the process fluid. A flow in a channel may have anon-turbulent, unmixed, or laminar flow and may be characterized by aReynolds number that is either not greater than approximately 1000, 100,10, 1, 0.1, or 0.01. Achieving such non-turbulent flow is not difficultat flow rates that are commonly employed in micro-fluidic structuressince the small dimensions and close proximity of the walls and otherno-flow boundaries in such micro-fluidic structures tend to promotelaminar flow. When the process and focusing flows have suchnon-turbulent flow they move nearly parallel to one other within thechannel without becoming significantly mixed in the direction normal totheir flow due to turbulence. The flows may experience limitedconcentration-driven diffusional mixing in the direction normal to theirboundary.

As the flows are received within the focusing manifold all four sides ofthe process flow may be impacted with and confined and focused by thecombined focusing flow. In the device illustrated in FIG. 2A the fourfocusing flows are received into the focusing manifold around all foursides of the process flow. In such a device focusing may includeimpacting a first side of the process flow with the first focusing flow,impacting a second side of the process flow with the second focusingflow, impacting a top of the process flow with the third focusing flow,and impacting a bottom of the process flow with the fourth focusingflow. In the type of laminar flow that occurs in micro-fluidic devicesthe focusing and process flows do not mix significantly at impact butinstead come into alignment with discrete interfaces and move togetheras separate and distinct flows through the manifold.

At impact the focusing flows exert forces, sometimes referred to ashydrodynamic forces, on the surfaces of the process flow, due to theirmotion. The hydrodynamic forces or pressures exerted by the focusingflows on the process flow compress the process flow within the focusingmanifold and outlet channel into a focused process flow or stream thathas a smaller cross sectional area. The pressures applied by thecombined focusing flow drive the extremities of the process flow inwardtoward the center from all sides and shrink the cross section. Thefocusing flows delivered through the first and second focusing channelscompress and focus the process flow in the lateral direction from bothsides whereas the focusing flows delivered through the third and fourthfocusing channels compress and focus the process flow in the verticaldirection from both sides. The combined focusing flow compresses andfocuses the process flow in the vertical and lateral directions inwardfrom each of its four sides. The amount of focusing increases withincreasing applied hydrodynamic force (i.e., with increasing flow ratesin the focusing channels). Increasing the focusing flow rate mayincrease the amount of focusing and decreased the focusing flow rate maydecrease the amount of focusing. The amount of focusing also dependsupon, and varies inversely with, the cross-sectional area of the outletchannel available for flow. Increasing the cross-sectional area maydecrease the amount of focusing and decreasing the cross-sectional areamay increase the amount of focusing. By varying these parameters theamount of focusing may be varied from a very small amount to a verylarge amount of focusing. When the focusing fluids delivered through thedifferent channels have similar hydrodynamic forces, for example similarflow rates, the amount of compression or focusing in the vertical andlateral directions may be similar. Optionally different hydrodynamicforces may be provided to the various focusing flows to modify theamount of compression and focusing along the different sides of theprocess flow and/or to control different amounts of hydrodynamicfocusing in the vertical and lateral directions.

The combined focusing flow completely surrounds and spatially confinesthe centralized process flow at or near the center of the focusingmanifold. The focusing flow separates the process flow from the walls ofthe focusing manifold including from upper and lower walls. Thecentralized process flow and the surrounding focusing flow move fromtheir respective inlet ports toward the outlet port. Laminar flow withminimal if any turbulence may be maintained within the focusing manifoldto minimize mixing. The focusing manifold may be designed with theoutlet channel substantially opposite the inlet channel to allow theprocess flow to proceed from its inlet directly across the focusingmanifold toward the outlet channel with a non-tortuous flow path. Theprocess flow and its associated surrounding focusing flow pass from themanifold to the outlet channel via the outlet port. The combinedfocusing flow completely surrounds and spatially confines thecentralized process flow at or near the center of the outlet channel.The combined focusing flow separates the centralized process flow fromthe channel walls. The shielding of the process flow from the channelwalls may be desired in numerous situations including when the processflow contains a component that may adhere to or otherwise beincompatible with the channel walls.

The focused process flow has a smaller cross-sectional area compared tothe cross-sectional area of the process flow in the inlet channel. Thismeans in part that a smaller volume of focused process fluid occupies agiven outlet channel length compared to the same length of inletchannel. This also means that a species of interest in the process flow,such as a molecule or cell of interest, may be confined to a smallerportion of the outlet channel. An advantage of the shown embodiment maybe that the molecule of interest may be confined in the verticaldirection to the portion of the channel occupied by the process flow sothat it is confined to a subset of the vertical positions between thetop and the bottom of the channel.

FIG. 3 shows a front perspective view of a hydrodynamic focusing device300, according to one embodiment of the invention. The hydrodynamicfocusing device contains a micro-fluidic inlet channel 320 to convey aprocess flow and a plurality of micro-fluidic focusing channels 340(340LS, 340RS, 340U1, 340U2, 340L1, and 340L2) to each convey one of aplurality of focusing flows to focus the process flow. The hydrodynamicfocusing device also contains a focusing manifold 310 coupled with theinlet channel 320 at an inlet channel port 350 and with the plurality offocusing channels 340 at a plurality of focusing channel ports 370(370LS, 370RS, 370U1, 370U2, 370L1 and 270L2). The focusing manifoldfocuses the process flow by contacting all four sides thereof with thefocusing flow. Still further the hydrodynamic focusing device contains amicro-fluidic outlet channel 330 coupled with the focusing manifold 310at an outlet channel port 360 to convey the combined focused processflow and focusing flow from the focusing manifold.

The plurality of focusing channels include six channels. The sixchannels include a first focusing channel 340LS on a first side of theinlet channel (a left side), a second focusing channel 340RS on a secondopposite side of the inlet channel (a right side), a third upperfocusing channel 340U1 over the inlet channel on the first side of thefocusing channel. Continuing on the six channels include a fourth upperfocusing channel 340U2 over the inlet channel on the second oppositeside of the focusing channel, a fifth lower focusing channel 340L1 underthe inlet channel on the first side of the focusing channel (not shown),and a sixth lower focusing channel 340L2 under the inlet channel on thesecond side of the focusing channel. As shown it may be appropriate forthe third and the fourth focusing channels, as well as for the fifth andthe sixth focusing channels, to have similar or substantially equalangles relative to the inlet channel. The substantially equal anglesencompass angles that differ by about 15° or less. This may help tocancel out components of momentum of the focusing flows conveyed throughthese channels, which are not aligned with the direction of the processflow, to cancel out within the focusing manifold, and may help avoidturning or mixing of the process flow. In the illustrated device, thethird and the fourth focusing channels, as well as the fifth and thesixth focusing channels, approach the focusing manifold from oppositesides at angles that are approximately normal or orthogonal to the inletchannel, although this is not required. Also as shown, the thirdfocusing channel may be substantially vertically aligned over the fifthfocusing channel and the fourth focusing channel may be substantiallyvertically aligned over the sixth focusing channel. If it is appropriateto avoid tilting or turning the process flow, then it may be appropriateto maintain similar or equal flow rates in the third and the fourthfocusing channels, and in the fifth and the sixth focusing channels.Alternatively, if it is appropriate to tilt or turn the process flow,then the amount of tilt or turn may be controlled by controllingdifferent flow rates in the third and the fourth focusing channels, andin the fifth and the sixth focusing channels in order to create a netmoment or force on the process flow. If desired the size of the third,fourth, fifth, and sixth focusing channels may be reduced, compared tothe size of the third and fourth focusing channel shown in FIG. 4, inorder to account for the additional flow capacity introduced through theaddition of the fifth and sixth flow channels in the illustrated device,although this is not required. Lower flow velocities may alternativelybe employed.

The focusing manifold includes the inlet port 350 to receive a processflow conveyed through the inlet channel, the outlet port 360 to providea focused process flow to the outlet channel, and the six of focusingflow ports 370 to receive the focusing flows. Specifically, the sixfocusing flow ports 370 include a first port 370LS (not visible) on thefirst side of the inlet channel (a left side) to receive a focusing flowconveyed through the first focusing channel, a second port 370RS on asecond side of the inlet channel (a right side) to receive a focusingflow conveyed through the second focusing channel, and a third upperport 370U1 over the inlet channel, on the first side of the focusingmanifold, to receive a focusing flow conveyed through the third focusingchannel. Continuing on, the six further include a fourth upper port370U2 over the inlet channel, on the second side of the focusingmanifold, to receive a focusing flow conveyed through the fourthfocusing channel, a fifth lower port 370L1 (not shown) under the inletchannel, on the first side of the focusing manifold, to receive afocusing flow conveyed through the fifth focusing channel, and a sixthlower port 370L2 under the inlet channel, on the second side of thefocusing manifold, to receive a focusing flow conveyed through the sixthfocusing channel. As shown, the third upper port 370U1 may besubstantially vertically aligned over the fifth lower port 370L1 (notshown) and the fourth upper port 370U2 may be substantially verticallyaligned over the sixth lower port 370L2, although this is not required.Other features of the device 300 may be similar to those of theabove-described device 200 shown in FIG. 2A.

FIG. 4 shows a front perspective view of a hydrodynamic focusing device400, according to an embodiment of the invention: The hydrodynamicfocusing device 400 has features similar to the device 300 shown in FIG.3, except for the omission of the fourth upper focusing channel 340U2over the inlet channel on the second opposite side of the focusingchannel, and the omission of the fifth lower focusing channel 340L1under the inlet channel on the first side of the focusing channel. Thefocusing device contains a micro-fluidic inlet channel 420 to convey aprocess flow and a plurality of micro-fluidic focusing channels 440(440LS, 440RS, 440U, and 440L) to each convey one of a plurality offocusing flows. The focusing device 400 also contains a focusingmanifold 410 coupled with the inlet channel 420 at an inlet channel port450 and with the plurality of focusing channels 440 at a plurality offocusing channel ports 470 (470LS, 470RS, 470U, and 470L) to focus theprocess flow by pressurized impact with focusing flow. Still further thefocusing device 400 contains a micro-fluidic outlet channel 430 coupledwith the focusing manifold 410 at an outlet channel port 460 to conveythe combined focused process flow and focusing flow from the focusingmanifold.

The four focusing channels include a first focusing channel 440LS on afirst side of the inlet channel, a second focusing channel 440RS on asecond opposite side of the inlet channel, a third upper focusingchannel 440U over the inlet channel on the first side of the focusingchannel, and a fourth lower focusing channel 440L under the inletchannel on the second side of the focusing channel. The third upper andthe fourth lower focusing channels approach the focusing manifold fromopposite sides of the inlet channel at angles that are approximatelynormal or orthogonal to the inlet channel, although this is notrequired. In another embodiment of the invention, the third and fourthfocusing channels may have any other angle relative to the inletchannel. For example the angles may be in a range between 0° to 90°relative to the inlet channel. The manifold includes an inlet port 450to receive a process flow conveyed through the inlet channel, an outletport 460 to provide a focused process flow to the outlet channel, andfour focusing flow ports 470, each corresponding to one of the fourfocusing channels, to receive the focusing flows. Specifically, the fourfocusing flow ports include a first port 470LS (not visible) on thefirst side of the inlet channel to receive a focusing flow conveyedthrough the first focusing channel, and a second port 470RS on a secondside of the inlet channel to receive a focusing flow conveyed throughthe second focusing channel. Continuing on the four focusing flow portsfurther include a third port 470U over the inlet channel, on the firstside of the focusing manifold, to receive a focusing flow conveyedthrough the third focusing channel, and a fourth port 470L under theinlet channel, on the second side of the focusing manifold, to receive afocusing flow conveyed through the fourth focusing channel.

The third and the fourth focusing flows exert net forces or moments onthe fluid within the focusing manifold that turn or tilt the processflow (see e.g., FIG. 7). The third focusing flow exerts a force to push,turn, or tilt the fluid in the upper portion of the manifold fluid,including at least a portion of the process fluid, away from the firstside where it enters. The fourth focusing flow exerts a force to push,turn, or tilt the lower portion of the manifold fluid, including atleast a portion of the process fluid, away from the second side where itenters. The net force or moment may tilt the process flow within thefocusing manifold so that an upper portion of the process flow in theoutlet channel may be tilted away from the first side of the focusingmanifold (away from the third focusing channel) and the lower portion ofthe process flow in the outlet channel may be tilted away from thesecond side of the focusing manifold (away from the fourth focusingchannel). An alternate mirror-image device is contemplated in which thethird upper and fourth lower focusing channels approach the focusingmanifold from opposite the shown directions. Also an alternateembodiment is contemplated in which one of the focusing channels isomitted and the process flow is focused by contacting three sidesthereof with the focusing flows provided through the three focusingchannels.

III. Experimental and Simulation Results

The inventors performed simulations using CoventorWare™, a commerciallyavailable computational fluid dynamics software package available fromCoventor Inc., of Cary, N.C. to confirm the focusing for the devicesshown in FIGS. 2A, 3, and 4. Conceptualized simulation results are shownin FIGS. 5-7. The simulations assumed 100 μm width by 50 μm depthchannels, an upright cylinder focusing manifold with 250 μm diameter and250 μm height, a process flow of 10 μl/min, and a combined focusing flowof 10 μl/min divided equally among the focusing channels. Greater degreeof focusing may be achieved by increasing the combined focusing flow totwo, three, four, or ten times, the process flow.

FIG. 5 conceptualizes simulation results at a cross section of theoutlet channel 230 of the device 200 indicated by a section line 5-5shown in FIG. 2A and shows a focused process flow 534 (with surfaces534A) and a combined focusing flow 536, according to an embodiment ofthe invention. As shown, the cross section of the focused process flowmay have a squared shape, such as square or rectangular, with perhapsslight rounded corners. The focused process flow cross sectional area ison the order of one-half the cross sectional area of the outlet channel.

FIG. 6 shows similar results for a focused process flow 634 and acombined focusing flow 636 at a cross section indicated by a sectionline 6-6 shown in FIG. 3, according to an embodiment of the invention.As shown, the cross section of the focused process flow may have arounded shape, such as circular or oval, with significant elimination ofthe corners. The cross sectional area of the focused process flow 634(for device 300) may be slightly smaller compared to the cross sectionalarea of the focused process flow 534 (for device 200). As shown in FIGS.5 and 6 the focused process flow is separated from all of the walls ofthe outlet channel, including upper and lower walls. Also, a verticaldimension or height of the focused process flow is less than a verticaldimension or height of the outlet channel.

FIG. 7 shows similar results for a focused process flow 734 and acombined focusing flow 736 at a cross section indicated by a sectionline 7-7 in FIG. 4, according to an embodiment of the invention. Asshown, the cross section of the focused process flow may be tilted, withthe top tilted away from the upper focusing channel, and with the bottomtilted away from the lower focusing channel, to give the focused processflow an angle, for example approximately 45°, in the outlet channel.Compared to those of FIGS. 5-6 the focused process flow 734 is lessconfined and focused along the upper right hand corner to lower lefthand corner diagonal of the outlet channel.

Experiments performed on an actual focusing device of the design shownin FIG. 4 confirm the simulation results shown in FIG. 7. In theexperiments the inventors used a Rhodamine 6G solution as a processflow, which fluoresces after exposure to laser radiation, and water as afocusing flow. Laser confocal microscopy was used to observe thefocusing of the Rhodamine 6G solution.

IV. Forming a Focusing Device

FIGS. 8A-8C show a method for forming the hydrodynamic focusing systemshown in FIG. 4 by a “membrane sandwich” method, according to oneembodiment of the invention. The inventors have adapted the method fromthe article, “Fabrication of Topologically Complex Three-DimensionalMicrofluidic Systems in PDMS by Rapid Prototyping”, by J. R. Anderson etal., published in Analytical Chemistry, Vol. 72, No. 14, published Jul.15, 2000, pages 3158-3164.

FIG. 8A shows a method for forming a PDMS master 808 that may be used tomold a centralized portion of the hydrodynamic focusing system 400,according to one embodiment of the invention. A silicon wafer 802measuring about 4 inches square was prepared as a support. The use of asilicon wafer is not required. The silicon wafer was singed at about150° C. for about 30 minutes. Then, SU-8 50 photoresist was spun ontothe singed silicon wafer 802 at about 2000 rpm for about 30 seconds toform a layer of photoresist on the silicon wafer 802. The layerthickness should be sufficient for the desired channel depth, forexample about 50 μm. The use of this photoresist is not required andother resists or radiation sensitive layers may also optionally beemployed. Then, the wafer having the photoresist layer was baked atabout 65° C. for about 6 minutes, and thereafter at about 95° C. forabout 20 minutes. Other temperatures and times may be appropriate forother resists.

Next, the photoresist layer was exposed through a patterned mask havinga hydrodynamic focusing system pattern. Designs of the micro fluidicchannels and other hydrodynamic focusing system portions were drawn toscale using a CAD program. The particular CAD program employed wasFreehand 9.0, available from Macromedia of San Francisco, Calif. Thechannel dimensions were about 100 μm in width and 50 μm in depth. Thefocusing manifold was about 250 μm in diameter and the thickness of thespacing volume layers were about 50 μm. The dimensions of the channel aswell as the interconnect layers are variable and could be achieved byfabricating different sets of masters. As stated, these dimensions areillustrative and are not required. The design was then printed onto aMylar transparency using a high-resolution printer (for example>3600dpi). Ultraviolet (UV) light having a wavelength of about 365 nm wasdirected through the patterned mask to selectively expose portions ofthe photoresist layer. A dose of about 400 mJ/cm was employed. Otherwavelengths and doses may be appropriate for other resists.

After exposure, the wafer having the exposed photoresist was baked atabout 65° C. for about 1 minute and then at 95° C. for about 5 minutes.After the post-exposure bake, the wafer was immersed in SU-8 developerfor about 10 minutes in order to develop the unexposed regions.Development yielded a one-level photoresist on silicon master 800containing a patterned photoresist layer 804 over the silicon wafer 802.The patterned photoresist layer 804 contains a void 806 that containsvoid portions approximately corresponding to the inlet channel 420, sidefocusing channels 440RS, 440LS, central portion of focusing manifold410, and outlet channel 430. The SU-8 photoresist on the wafer was thensilanized for about 1 hour by placing the wafers in proximity with a fewdrops of trimethylchlorosilane in a vacuum desiccator. The silanizedpatterned photoresist layer 804 on the silicon wafer 802 represents alithographically patterned photoresist on silicon master 800.

The patterned photoresist on silicon master 800 was used as the masterto micro-mold a master for a centralized portion of the hydrodynamicfocusing system. A curable material was poured over the silanizedphotoresist on silicon master 800. The curable material used in thisparticular example was a PDMS precursor material. PDMS may offer certainadvantages such as compatibility with biological materials and chemicalsand transparency to facilitate alignment, although the use of PDMS isnot required and other curable materials may optionally be employed. ThePDMS precursor material was prepared by combining 10 parts by weight ofSylgard A with about 1 part by weight of Sylgard B. Sylgard A and B arebrand silicon elastomer forming materials that are commerciallyavailable from Dow Corning of Midland, Mich. The combination was mixedthoroughly and degassed to remove any air bubbles to form the PDMSprecursor. A PDMS sheet or flat slab 810 was applied to the PDMSprecursor and sufficient pressure was applied to form contact withoutdamaging or distorting features.

The PDMS precursor material on the master was cured at about 65° C. forabout 2 hours. The curing solidified the PDMS precursor material as asolid PDMS material. A PDMS master 808 was carefully peeled away fromthe patterned photoresist on silicon master 800. The PDMS master 808contains a patterned PDMS portion 812 corresponding to the void 806attached to the PDMS sheet 810. The PDMS master 808 was plasma treatedfor about 1 minute, and then silanized for about 3 to 4 hours inproximity to a few drops of trimethylchlorosilane in a vacuumdesiccator. This PDMS master 808 contains the patterned PDMS portion812. The PDMS master may be used to mold the centralized portion of thehydrodynamic focusing system, including the inlet channel 420, the sidefocusing channels 440RS, 440LS, the central portion of focusing manifold410, and the outlet channel 430.

FIG. 8B shows a method for forming an upper, two-level photoresist onsilicon master 828, and then using the photoresist on silicon master828, together with the PDMS master 808 (from FIG. 8A), to form an upperand centralized portion of the hydrodynamic focusing system 400,according to one embodiment of the invention. Initially, two-levelphotolithography was used to fabricate first and second patternedphotoresist layers on a second silicon wafer. The second silicon waferwas singed at about 150° C. for about 30 minutes. SU-8 50 photoresistwas spun over the wafer at about 2000 rpm for about 30 seconds to form aphotoresist layer. The thickness was about 50 μm. The wafer having thephotoresist layer was baked at about 65° C. for about 6 minutes and thenat about 95° C. for about 20 minutes. The wafer was then exposed using365 nm UV light at a dose of about 350 to 400 mJ/cm². A patternedtransparency mask was used to form the patterned portion 824. Ahypothetical view of a one-level photoresist on silicon mask 820 shows apatterned photoresist layer 824 over the silicon wafer 822. Thepatterned photoresist 824 contains portions corresponding to the upperfocusing channel 440U and an upper portion of the focusing manifold 410.The view would normally not be seen since development in this method isgenerally not performed until after exposure of the second photoresistlayer. Then, the exposed wafer was post-exposure baked at about 65° C.for about 1 minute and then at about 95° C. for about 5 minutes.

After the post-exposure bake, instead of developing, a layer of SU-8photoresist was formed over the existing exposed and baked photoresistlayer with spinning. A thickness of about 50 μm was employed to providean interconnect between the different layers. Then, the wafer wassoft-baked at about 65° C. for about 6 minutes and then at about 95° C.for about 20 minutes. Several additional minutes at each temperature maybe appropriate if a thicker layer is employed, for example a 100 μmlayer. Then, the wafer was exposed using a mask that contains the secondlevel of features. The second level may form the interconnection betweenthe different layers during the final sandwich assembly. The secondlevel of features include a circle with a diameter of about 250 μmcorresponding in position to the upper spacing volume 480U. Alignment ofthe features was achieved by aligning the marks in the first layer ofthe exposed and cross-linked photoresist with the marks in thetransparency mask. After exposure, the wafers were baked at about 65° C.for about 1 min and then at about 95° C. for about 5 minutes. Anadditional 5 minutes at 95° C. may be appropriate for a 100 μm layer.

Then, both layers of the photoresist were developed simultaneously byimmersing in SU-8 developer for about 15-20 minutes. Development yieldsa two-level photoresist on silicon master 828 that includes a firstpatterned photoresist layer 824 on a silicon wafer 822, and a secondpatterned photoresist layer 826 on the first patterned photoresist layer824.

The silanized PDMS master 808 (from FIG. 8A) and the two-levelphotoresist on silicon master 828 were brought face-to face in theproper relative orientation (see FIG. 4) with a few drops of the PDMSprecursor disposed there between. The features were aligned using asimple stereomicroscope. Sufficient pressure was applied to the top PDMSmaster to exude the excess precursor from between the two masters. Thepressure was less than that which would deform the masters. The assemblywas then cured at about 65° C. for about 1 hour. Once cured, the topPDMS master with the membrane was carefully peeled away from thetwo-level photoresist on silicon master 828. An intermediate assembly832 includes molded PDMS 834 attached to the PDMS sheet 810. Immediatelyto the right of the intermediate assembly 832 is a hypothetical bottomview 835 of the intermediate assembly 832. The hypothetical bottom viewimagines looking through the PDMS sheet 810 and molded PDMS 812 andshows the centralized portions of the hydrodynamic focusing system 400molded from the PDMS master 808.

To facilitate removal of the molded PDMS 834 from the PDMS sheet 810 andmolded PDMS 812, another thin PDMS sheet 838 was bonded to the top ofthe molded PDMS 834 where the two-level photoresist on silicon master828 was removed. Plasma oxidation was used to achieve bonding and theassembly was cured at about 65° C. for about 30 minutes to improve thebonding between the plasma-treated surfaces. Then, the bonded PDMS sheet838 and molded PDMS 834 were carefully peeled away from the initial,more weakly attached PDMS master 808 to form an intermediate assembly836. Then reservoir holes may be punched in the PDMS slab using astandard 6 mm hole puncher.

FIG. 8C shows a method for forming a two-level photoresist on siliconmaster 856 and then using the master 856 to form an upper portion of thehydrodynamic focusing system 400, according to one embodiment of theinvention. Initially, the two-level photoresist on silicon master 856may be formed similarly to the two-level photoresist on silicon master828 shown and described in FIG. 8B.

Then, a PDMS sheet 862 was used to sandwich a PDMS precursor solution860 on top of the two-level photoresist on silicon master 856.Sufficient pressure was applied to the top PDMS sheet 862 to exude theexcess precursor without deforming the PDMS. The assembly was then curedat about 65° C. for about 1 hour. Once cured, the PDMS sheet 862 withthe cured molded PDMS 864 attached thereto was carefully peeled awayfrom the two-level photoresist on silicon master 856 to form anintermediate assembly 864.

To help remove the molded PDMS 866 from the PDMS sheet 862, another PDMSsheet 870 was bonded to the molded PDMS 866 where the two-levelphotoresist on silicon master 856 was removed. Plasma oxidation was usedto form the initial attachment and the assembly was cured at about 65°C. for about 30 minutes to improve the bonding between theplasma-treated surfaces. Then the molded PDMS 866 and bonded PDMS sheet870 were carefully peeled away from the more weakly bonded initial PDMSsheet 862.

FIG. 8D shows a method for forming the hydrodynamic focusing system bybonding the intermediate assembly 836 (from FIG. 8B) containing themolded PDMS 834 and bonded PDMS sheet 838 to the intermediate assembly868 (from FIG. 8C) containing the molded PDMS 866 and bonded PDMS sheet870, according to one embodiment of the invention. The intermediateassemblies were placed with their molded PDMS portions facing oneanother and were aligned using a simple xyz stage with rotational andtilt freedoms. The orientation had the focusing channel of the moldedPDMS 866 orthogonal to the inlet channel of the molded PDMS 836. Theentire alignment system was placed inside a plasma chamber and wasplasma treated for about 1 minute at about 100 Watts. Then, after plasmatreatment, the molded PDMS portions were brought into conformal contactand cured at about 65° C. for about 30 minutes to improve bonding. Thebonding of these assemblies completes the assembly of the hydrodynamicfocusing system 400. As desired, syringes, tubing, or other fluid pathsmay be coupled with the hydrodynamic focusing system using techniquesknown in the arts. If desired, a transparent coverslip, such as a glassslide, may be incorporated using techniques known in the arts.

The above exemplary method of forming a hydrodynamic focusing system isto be construed as merely illustrative, rather than limiting, and toallow one skilled in the art to utilize the invention. The particularmethod described above is not required, and variations of the method, aswell as entirely different methods may be used to form hydrodynamicfocusing systems. In alternate embodiments of the invention, thefocusing devices shown and described herein may be formed by variousmicro-machining methods (e.g., micro-milling, laser ablation, or focusedion beam milling), additive and subtractive methods (e.g., depositionand lithographic etch), various material reforming methods (e.g.,molding, injection molding, stamping, hot embossing, casting, etc.), aswell as combinations of these techniques (e.g., focused ion beam pluschemical vapor deposition). Any machinable, etchable, reformable,moldable, stampable, embossable, or castable material may potentially beused. Suitable materials include but are not limited to inorganicmaterials, such as ceramics, silicon, quartz, glass, and metals (e.g.,stainless steel or aluminum), and organic materials, such as polymers.Suitable polymers include among others polycarbonate,poly(methylmethacrylate) (PMMA), poly(methylsiloxine),poly(dimethylsiloxane) (PDMS), or poly(tetrafluoroethylene) (e.g.,Teflon®)), and combinations of these materials. It may be appropriate toform focusing devices of polymers because these materials areinexpensive and may be injection molded, hot embossed, and cast.Although glass or quartz materials may be appropriate when organicsolvents or high temperatures are used.

V. Exemplary Applications of Hydrodynamic Focusing

An embodiment of the invention may be used to vertically andhorizontally focus or narrow a process flow inward from at least threeor four sides thereof with the focusing flows.

An embodiment of the invention may be used to vertically focus theprocess flow to a vertical dimension that is less than a verticaldimension of the outlet channel with the focusing flows. The processflow vertical dimension may be customized and controlled at a value lessthan the vertical distance from the lower wall of the outlet channel tothe upper wall of the outlet channel.

An embodiment of the invention may be used to separate or isolate atleast three or four sides of a process flow from outlet channel wallswith the focusing flows. In one aspect a top side and/or a bottomside ofa process flow may be respectively separated from upper and lower wallsof an outlet channel with the focusing flows.

An embodiment of the invention may be used to horizontally andvertically focus a process flow to a cross sectional size and/or shapewith the focusing flows. As one example, a predetermined cross sectionalshape and aspect ratio may be controlled by providing a predeterminedpressures or flow rates in focusing channels on sides of the inletchannel and corresponding predetermined pressures or flow rates infocusing channels over and under the inlet channel.

An embodiment of the invention may be used to move or precisely positiona focused process flow to virtually any desired location within anoutlet channel with the focusing flows. At least one of the focusingflows may be introduced with a different pressure or flow rate and thefocused process flow may be moved or positioned based on the differentpressure or flow rate. As one example, a focused process flow may bemoved upward in the outlet channel by increasing a flow rate or pressureof focusing flow in a focusing channel under the inlet channel.Alternatively, a focused process flow may be moved downward in theoutlet channel by increasing a flow rate or pressure of focusing flow ina focusing channel over the inlet channel.

An embodiment of the invention may be used to tilt or otherwisevertically realign the focused process flow with the focusing flows.

An embodiment of the invention may be used to focus a process flow forimproved sample analysis. For example, a process flow containing abiological molecule, such as a nucleic acid derivative, fluorescentlylabeled biological molecule, or protein, may be focused and analyzed.Further aspects will be discussed below.

An embodiment of the invention may be used to perform diffusion-basedmixing of a focused process flow with a focusing flow.

An embodiment of the invention may be used to transport and preciselyposition single molecules or small numbers of molecules or particles ina focused process flow for nucleic acid sequencing or other applicationswith a focusing flow.

An embodiment of the invention may be used to perform a chemicalreaction in a focused process flow. For example, an embodiment of theinvention may be used to fabricate a structure, such as a wall ordivider within a micro-fluidic channel, as disclosed in co-pending U.S.patent application Ser. No. 10/609,322 filed on Jun. 26, 2003.

VI. Hydrodynamic Focusing in Sample Analysis

FIG. 9 shows a sample analysis system 990 containing an analysis device994 to analyze a focused process flow 934 in an analysis region 932 ofan outlet channel 930 of a hydrodynamic focusing device 900 residing ona micro-fluidic device 992, according to an embodiment of the invention.The hydrodynamic focusing may help to focus the process flow inward fromat least three or four sides thereof, separate the focused process flowfrom walls of the outlet channel, reduce a cross sectional dimension orarea of the focused process flow so that it is better suited foranalysis, and otherwise improve sample analysis.

The sample analysis system 990 contains a micro-fluidic device 992containing the focusing device 900. Without limitation, themicro-fluidic device 992 may comprise a small, conveniently sized,portable, hand-held, reusable or disposable micro-fluidic analysissystem. The micro-fluidic device generally provides process and focusingflows to the hydrodynamic focusing system and may perform other desiredoperations. The process and focusing flows may be provided to thechannels from an external or off-device source, such as a syringe orother fluid supply device, or an on-device source, such as a channel orother fluid passage. If an off-device fluid source is appropriate themicro-fluidic device may contain ports, for example containing a rubberor other elastomeric material, for insertion of syringe needles for theprocess and focusing flows.

The invention is generally not limited to any known process flow.Suitable process flows may comprise an aqueous, organic, or biologicalsolution. The process flow may contain a species of interest 938. Thespecies of interest may comprise a biological material, such as a cell,organelle, liposome, biological molecule or macromolecule, enzyme,protein, protein derivative, protein fragment, polypeptide, nucleicacid, DNA, RNA, nucleic acid derivative, biological molecule tagged witha particle, fluorescently labeled biological molecule, charged species,or charged protein.

The focusing device 900 contains an inlet channel 920 that receives theprocess flow, a plurality of focusing channels 940 that receive focusingflows, a focusing manifold 910, and an outlet channel 930. The focusingdevice produces a focused process flow 934 in the outlet channel. Theoutlet channel may contain an analysis region often located sufficientlyproximate the outlet port of the focusing manifold to maintain anappropriate level of mixing due to diffusion. The focused process flowmay be horizontally and vertically focused, constricted, or narrowedfrom at least three, or four sides thereof, by an outer focusing orsheath flow 936. The focused process flow may be centralized, notnecessarily perfectly centered, and completely surrounded and confinedon all sides thereof by the outer focusing or sheath flow. The focusingor sheath flow may separate the focused process flow from the outletchannel walls. This separation may be appropriate when at least aportion of the process flow may adhere to, foul, be sheared by, orotherwise be incompatible with the channel walls.

The sample analysis system also includes an analysis device 994 toanalyze the focused process flow 934 in the analysis region 932 of theoutlet channel. The analysis device may include a spectrometer, such asa Raman spectrometer. The Raman spectrometer may provide a coherentlight from a laser, laser diode, or other light source portion to thefocused process flow through a transparent material or other window ofthe outlet channel. The focused process flow may receive the light andinelastically scatter the light, fluoresce, or otherwise respond. Thespectrometer may include a detector device portion to detect theinelastically scattered or fluoresced light. Alternatively, the analysisdevice may include a transistor to detect a charged species, such as acharged biological molecule, protein fragment, or cell, within thefocused process flow. Other analysis devices known in the arts mayalternatively be employed.

In one aspect, the focused process flow 934 may have a cross sectionaldimension or area that may be better suited for analysis. The analysissystem may utilize a light beam or other signal with a smaller crosssectional dimension or area than a cross sectional dimension or area ofthe outlet channel. Without hydrodynamic focusing the species ofinterest may assume virtually any position within the entire crosssection of the outlet channel and is generally not constrained to theportion of the outlet channel where the small interrogation signal orbeam may be directed. As a result the species of interest may passthrough the analysis region undetected. However, focusing may beadvantageously employed to accurately position and focus the focusedprocess flow 934 containing the species of interest in a portion of theoutlet channel where it may be detected with the beam. For example, thefocused process flow 934 may have a cross sectional dimension or area(indicated schematically by linear dimension r₁) that is not largerthan, or that is smaller than, a cross sectional dimension or area ofthe interrogation signal or beam (indicated schematically by lineardimension r₂). Accordingly the focusing may help improve reliability ofdetection of a species of interest in the process flow.

An optional computer system 998 may be used to process informationassociated with the analysis. As desired, a representation of thedetected result may be provided to the optional computer system 998. Thecomputer system may be programmed with instructions to analyze therepresentation of the detected signal. The analysis may provide anidentification of a species of interest, such as an identity of abiological molecule, for example.

In an embodiment of the invention the analysis system may be used tosequence a nucleic acid and the focusing device may be used to focus aprocess flow containing a nucleic acid derivative in the analysis regionof the outlet channel to improve detection of the nucleic acidderivative and maintain a more accurate sequence. The inlet channel mayreceive an aqueous solution containing a nucleic acid derivative andpotentially chemical additives. Suitable nucleic acid derivativesinclude but are not limited to portions of nucleic acids, nucleic acidfragments, nucleotides, nucleosides (e.g. adenosine, cytidine,guanosine, thymidine, undine), bases (e.g. adenine, cytosine, guanine,thymine, uracil), purines, pyrimidines, or derivatives of one of thesemolecules.

The process flow containing the nucleic acid derivative may be providedto the focusing device and focused. Thereafter the focused process flowmay be flowed to the analysis region and the analysis device may analyzethe focused process flow. It may be appropriate to detect each of thenucleic acid derivatives, inasmuch as missing even one may lead to aninaccurate nucleic acid sequence. The cross sectional area of the outletchannel may be relatively large, for example 100 μm by 50 μm, comparedto the cross sectional area of the analysis signal, which for examplemay comprise a laser beam having a diameter in the range of 0.1 μm to 50μm, 1 μm to 10 μm, or 1 μm to 5 μm. With focusing the nucleic acidderivative may be confined within a focused process flow having afocused cross sectional dimension that related to and substantially morecommensurate with a cross sectional dimension of the analysis signal orbeam. For example the cross sectional dimension of the focused processflow may be not greater than, or may be less than, the cross sectionaldimension of the analysis signal or beam. As an example, the focusedprocess flow may have a cross sectional dimension that is in a rangebetween 0.1 μm to 50 μm, 1 μm to 10 μm, or 1 μm to 5 μm in order toconfine a nucleic acid derivative to a portion of the analysis regionaffected by a laser beam having an approximately equal diameter. Suchfocusing may help improve detection of nucleic acid derivatives and mayhelp to maintain an accurate nucleic acid sequence.

VII. General Matters

In the description above, for the purposes of explanation, numerousspecific details are set forth in order to provide a thoroughunderstanding of the present invention. It will be apparent, however, toone skilled in the art that the present invention is not limited to theembodiments described, but can be practiced without some of thesespecific details, and can be practiced with modification and alterationwithin the spirit and scope of the appended claims. As an example, oneor more additional focusing channels may be added to the hydrodynamicfocusing systems illustrated in FIGS. 2-4 to give a total of 5, 6, 7,10, or more focusing channels. As another example, the focusing channelsmay be staggered, spaced apart, or offset from one another, along theprocess flow direction, rather than being grouped together at a commonjunction, to allow serial focusing by serial introduction of focusingfluids from the offset focusing channels. As yet another example, theupper and lower focusing channels may be vertically angled or tilted atnon-orthogonal angles relative to the plane of the process flow and sidechannels. In other instances, well-known structures, devices, andtechniques have been shown in block diagram form or without detail inorder not to obscure the understanding of this description. With respectto the above description then, it is to be realized that the optimumdimensional relationships for the parts of the invention, to includevariations in size, materials, shape, form, function and manner ofoperation, assembly and use, are deemed readily apparent to one ofordinary skill in the art, and all equivalent relationships to thoseillustrated in the drawings and described in the specification areintended to be encompassed by the present invention.

Many of the methods are described in their most basic form, butoperations can be added to or deleted from any of the methods. It willbe apparent to those skilled in the art that many further modificationsand adaptations can be made. The particular embodiments are not providedto limit the invention but to illustrate it. The scope of the presentinvention is not to be determined by the specific examples providedabove but only by the claims below.

It should also be appreciated that reference throughout thisspecification to “one embodiment” or “an embodiment” means that aparticular feature can be included in the practice of the invention.Similarly, it should be appreciated that in the foregoing description ofexemplary embodiments of the invention, various features of theinvention are sometimes grouped together in a single embodiment, Figure,or description thereof for the purpose of streamlining the disclosureand aiding in the understanding of one or more of the various inventiveaspects. This method of disclosure, however, is not to be interpreted asreflecting an intention that the claimed invention requires morefeatures than are expressly recited in each claim. Rather, as thefollowing claims reflect, inventive aspects lie in less than allfeatures of a single foregoing disclosed embodiment. Thus, the claimsfollowing the Detailed Description are hereby expressly incorporatedinto this Detailed Description, with each claim standing on its own as aseparate embodiment of this invention.

What is claimed is:
 1. An analysis system comprising a hydrodynamicfocusing device comprising: a micro-fluidic inlet channel to convey aprocess flow; at least four micro-fluidic focusing channels to eachconvey one of at least four focusing flows, the at least fourmicro-fluidic focusing channels comprising a first channel, a secondchannel, a third channel and a fourth channel; a focusing manifoldhaving a plurality of areas coupled with the micro-fluidic inlet channelat an inlet port and with the at least four micro-fluidic focusingchannels at a plurality of focusing channel ports, wherein the focusingmanifold is configured to focus the process flow by contacting theprocess flow with the at least four focusing flows from at least fourdifferent directions to form a focused process flow, wherein eachdifferent direction is from a different area of the focusing manifold;and a micro-fluidic outlet channel coupled with the focusing manifold atan outlet channel port to convey the focused process flow and thefocusing flows from the focusing manifold; and an analysis device toanalyze the focused process flow; wherein the focused process flow isseparated from each wall of the micro-fluidic outlet channel with the atleast four focusing flows; wherein the first and second channels areparallel and coplanar with the micro-fluidic inlet channel in a verticalplane; wherein the third and fourth channels are angled with respect toand coplanar with the micro-fluidic inlet channel in a horizontal plane.2. The analysis system of claim 1, wherein the analysis device beinglocated at a location such that the interrogation signal or beam isconfigured to analyze the focused process flow.
 3. The analysis systemof claim 1, further comprising a source of a biological molecule coupledwith the micro-fluidic inlet channel.
 4. The analysis system of claim 3,wherein the source of the biological molecule comprises a source of afluorescently labeled biological molecule.
 5. The analysis system ofclaim 3, wherein the source of the biological molecule comprises asource of a nucleic acid derivative.
 6. The analysis system of claim 3,wherein the source of the biological molecule comprises a source of aprotein.
 7. The analysis system of claim 1, wherein the focused processflow has a cross-sectional dimension in a range of 0.1 μm to 50 μm. 8.The analysis system of claim 1, wherein the focused process flow has across-sectional dimension in a range of 0.1 μm to 10 μm.
 9. The analysissystem of claim 2, wherein the process flow a cross-sectional dimensionin a range of 0.1 μm to 50 μm.
 10. The analysis system of claim 2,wherein the process flow has a cross-sectional dimension in a range of0.1 μm to 10 μm.
 11. The analysis system of claim 1, wherein theanalysis device comprises a Raman spectrometer.
 12. The analysis systemof claim 1, wherein the analysis system is configured to focus theprocess flow by surrounding and spatially confining the process flowwith the at least four focusing flows.
 13. The analysis system of claim2, wherein the analysis system is configured to focus the process flowby contacting the process flow from at least four different directionswith the at least four focusing flows.
 14. An analysis system comprisinga hydrodynamic focusing device comprising: a micro-fluidic inlet channelto convey a process flow; at least four micro-fluidic focusing channelsto each convey one of at least four of focusing flows, the at least fourmicro-fluidic focusing channels comprising a first channel, a secondchannel, a third channel and a fourth channel; a focusing manifoldcoupled with the micro-fluidic inlet channel at an inlet port and withthe at least four micro-fluidic focusing channels at least four focusingchannel ports, wherein the focusing manifold is configured to focus theprocess flow by contacting the process flow with the at least fourfocusing flows to form a focused process flow having a first crosssectional area, wherein each of the focusing flows is from a differentarea of the focusing manifold; and a micro-fluidic outlet channelcoupled with the focusing manifold at an outlet channel port to conveythe focused process flow and the focusing flows from the focusingmanifold, the micro-fluidic outlet channel comprising a polygonalcross-section with a least four sides; wherein the focused process flowis separated from each wall of the micro-fluidic outlet channel with theat least four focusing flows; wherein the first and second channels areparallel and coplanar with the micro-fluidic inlet channel in a verticalplane; wherein the third and fourth channels are angled with respect toand coplanar with the micro-fluidic inlet channel in a horizontal plane.15. The analysis system of claim 14, further comprising an analysisdevice configured to emit an interrogation signal or beam having asecond cross sectional area to analyze the focused process flow havingthe first cross sectional area, wherein the first cross sectional areais smaller than the second cross sectional area, the analysis devicebeing located at a location such that the interrogation signal or beamis configured to analyze the focused process flow.
 16. The analysissystem of claim 14, wherein the process flow is separated from a wall ofthe micro-fluidic outlet channel with the at least four focusing flows.17. The analysis system of claim 14, wherein the focused process flowhas a cross sectional dimension that is not greater than a crosssectional dimension of an interrogation signal associated with ananalysis of the focused process flow.
 18. The analysis system of claim1, wherein the at least four micro-fluidic focusing channels are notcoplanar.
 19. The analysis system of claim 14, wherein the at least fourmicro-fluidic focusing channels are not coplanar.
 20. The analysissystem of claim 1, wherein at least one of the at least fourmicro-fluidic focusing channels is not substantially parallel withanother of the at least four micro-fluidic focusing channels.
 21. Theanalysis system of claim 14, wherein at least one of the at least fourmicro-fluidic focusing channels is not substantially parallel withanother of the at least four micro-fluidic focusing channels.